Titanium disilicide

Titanium disilicide[1]
IUPAC name

Titanium disilicide
Other names

Titanium silicide
Identifiers
CAS number 12039-83-7 Y
PubChem 6336889
Properties
Molecular formula TiSi2
Molar mass 104.038 g/mol
Appearance black orthorhombic crystals
Density 4.02 g/cm3
Melting point

1470°C
Solubility in water insoluble
Solubility soluble in HF
Related compounds
Other cations Zirconium disilicide
Hafnium disilicide
 Y (verify) (what is: Y/N?)
Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
Infobox references

Titanium disilicide (TiSi2) is an inorganic chemical compound.

Titanium silicide is used in semiconductor industry. It's typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In microelectronic industry is typically used in the C54 phase.

References

  1. ^ Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, FL: CRC Press, pp. 4–91, ISBN 0-8493-0594-2